ME-100 3D Implementation Manual Type Wafer Chemical Cleaning Device
This is a wafer chemical cleaning device of the manual type for 3D implementation!
The processing capacity is suitable for small quantities of 1-3 sheets, making it ideal for research and experimental purposes. There are no installation constraints with a 100V power supply. Its compact size allows for installation in just 1 square meter, making it economical. The pure water rinse uses a cascade system to minimize pure water consumption, resulting in low costs. The chemical temperature can be controlled. The rinse effect is assessed using a resistivity meter. The wafer cassette is designed with an incline to prevent liquid residue on the wafer surface. Space has been secured for the future addition of a second tank (including the lower tank). It comes with an air gun. The chemical tank can be easily cleaned with a shower nozzle.
- Company：マック産業機器 テクノロジーセンター
- Price：5 million yen-10 million yen
